Helios 5 UC

SEM - Scanning Electron Microscope

- Source : UC+ Schottky Field Emitter

- Acceleration Voltage : 350 V – 30 kV

- Beam Current : 1 pA – 100 nA

- Resolution @ 1 kV to 15 kV : 0,7 nm

- Beam Deceleration : Landing Voltage 20 eV to 30 keV

FIB – Focused Ion Beam

- Source : Ga LMIS

- Acceleration Voltage : 500 V to 30 kV

- Beam Current : 1 pA – 100 nA

- Resolution @ 30 kV : 2,5 nm

Stage

- XY : 150 mm x 150 mm, piezo driven (repeat. 1 µm)

- Z : 10 mm

- Rotation : 360° endless, piezo driven

- Tilt : -10 to 60°

Detectors

For SE and BSE and also for transmission configuration

- ETD, TLD, MD, ICD, DBS, STEM, ICE

- IR-CCD and NavCam

GIS – Gas Injection System

MultiChem Gas Delivery System with motorized gas needle alignment

- Pt deposition

- W deposition

- C deposition

- XeF2 enhanced milling

Nanomanipulators

- Easylift EX linked to AutoTEM for automatic TEM lamella preparation

- Kleindiek MM3A with RoTip and Micro Gripper System

Patterning

Control of the beam for milling, enhanced milling and deposition

- Integrated system for basic shapes

- Raith Elphy Multibeam for advanced tasks

Other capabilities

Plasma Cleaner

Charge Neutralizer

Auto Slice & View