• Application Field

• Ion beam lithography
• Cross section and 3D reconstruction
• SEM observation

• Technical Characteristics

Elstar UHR immersion lens FESEM column

• Electrostatic scanning
• Constant power lens technology
• Fast beam blanker (5 MHz)
• Landing voltage 50 V – 30 kV
• Probe current up to 22 nA

Electron beam resolution @ optimum WD

• 0.9 nm @ 15 kV
• 1.4 nm @ 1kV

Tomahawk ion column

• Up to 60 A.cm² beam current density
• 15 apertures (1 pA – 65 nA)
• Landing voltage 500 V – 30 kV

Ion beam resolution @ coincident point

• 4.5 nm @ 30 kV

High precision 5-axes motorized stage

• XY : 150 mm x 150 mm, piezo driven
• Z : 10 mm
• T : -10° to +60°
• R : 360° endless, piezo driven
• Tilt accuracy (between 50 and 54°) 0.1°

Detectors

• Elstar in-lens SE detector  (TLD-SE)
• Elstar in-lens BSE detector (TLD-BSE)
• Everhart-Thornley SE detector (ETD)
• High contrast BSE detector (DBS)
• SE and SI detector (ICE)
• IR Camera / NavCam

Gas Injection System

• Platinum deposition
• Insulator deposition (SiO_x)
• Enhanced etch (iodine)
• Insulator enhanced etch (XeF₂)

Others

• 3D reconstruction (slice & view)
• Flood Gun

Raith Elphy Multibeam

• GDSII editor
• 50 ns min. dwell time
• Drift correction
• Overlay and stitching possible, accuracy function of used beam and field size