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| ACS 200 | Lithography | Laurent ROBERT | | SUSS Microtec | ACS200 GEN3 |
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| ALD | Deposition | Stefania OLIVERI | Matthieu Micolle | VEECO | Fiji Gen 2 |
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| Aligner Double Side EVG | Lithography | Laurent ROBERT | | EVG | 620 |
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| Aligner DUV EVG | Lithography | Laurent ROBERT | | EVG | 620 |
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| Aligneur Simple Face | Lithography | Laurent ROBERT | | Karl Suss | MG1410 |
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| Alphacam Software | Packaging | Sylwester BARGIEL | | Vero Software | Alphacam 2018 R2 |
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| Bond Tester DAGE4000Plus | Packaging | Sylwester BARGIEL | | Nordson | DAGE 4000 plus |
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| CMP Alpsitec E460 | Dicing - Polishing | Ludovic GAUTHIER-MANUEL | | Alpsitec | E460 |
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| Confocal profilometer Nanojura | Characterization | Franck CHOLLET | | Nanojura | UHP |
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| Contact Angle Metrology GBX MCAT | Characterization | Franck CHOLLET | | GBX | MCAT |
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| CPD Sécheur super-critique | Lithography | Gwenn ULLIAC | | TOUSIMIS | Autosamdri 931 |
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| Cr/Carbon Coater | Characterization | Marina RASCHETTI | Roland SALUT | Leica | EM ACE 600 |
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| DRIE 6 pouces | Plasma etching | Djaffar BELHARET | Samuel Queste | SPTS | Rapier Omega C2L |
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| DRIE SPTS | Plasma etching | Djaffar BELHARET | Samuel Queste | SPTS | Rapier |
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| DRIE STS | Plasma etching | Djaffar BELHARET | Samuel Queste | STS | APS |
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| DSM8 | Lithography | Laurent ROBERT | | Suss Microtec | DSM8 GEN2 |
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| Electroformage 1 | Chemistry | Marion Vieira | Laurent ROBERT | XXX | XXX |
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| Electroformage 2 | Chemistry | Marion Vieira | Laurent ROBERT | XXX | XXX |
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| Electroplating Ni Yamamoto | Chemistry | Marion Vieira | Laurent ROBERT | PTS/Yamamoto | Electroplating Ni Yamamoto |
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| Ellipsometer Accurion | Characterization | Laurent ROBERT | Marina RASCHETTI | Accurion | nanofilm-ep4SE |
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| Evap MEB600 | Deposition | Stefania OLIVERI | Matthieu Micolle | Plassys | MEB600 |
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| Evap-EVA450 | Deposition | Stefania OLIVERI | Matthieu Micolle | Alliance Concept | EVA450 |
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| FEMTOprint 3D Glass machining | Packaging | Sylwester BARGIEL | | FEMTOPRINT | f100 aHead Enhanced |
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| FIB FEI | Nanotechnology | Roland SALUT | Marina RASCHETTI | FEI | Helios Nanolab 600i |
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| Filmetrics F50 EXR | Lithography | Laurent ROBERT | | Filmetrics | F50 EXR |
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| Flip-Chip bonder FC250 | Packaging | Sylwester BARGIEL | | Suss Microtec | FC250 |
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| Four RTP | Thermal processes | Stefania OLIVERI | Matthieu Micolle | Annealsys | AS-Premium RTP |
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| Four-tube1-Si | Thermal processes | Stefania OLIVERI | Matthieu Micolle | AET | XXX |
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| Four-tube2-LiNbO3 | Thermal processes | Stefania OLIVERI | Matthieu Micolle | AET | XXX |
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| Four-tube3-1000°C max | Thermal processes | Stefania OLIVERI | Matthieu Micolle | AET | XXX |
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| FSM | Characterization | Marina RASCHETTI | Laurent ROBERT | FSMG | 500 TC |
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| HF Vapor | Chemistry | Marion Vieira | Laurent ROBERT | Idonus | HF VPE-100 |
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| Hot Plate Manual | Lithography | Laurent ROBERT | | Prazitherm | XXX |
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| Hot Plate Programmable 1 | Lithography | Laurent ROBERT | | Prazitherm | XXX |
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| Hot Plate Programmable 2 | Lithography | Laurent ROBERT | | Prazitherm | XXX |
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| ICP-Chlorée | Plasma etching | Djaffar BELHARET | Samuel Queste | Plasma-Therm | Corial 201 IL |
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| ICPECVD | Deposition | Stefania OLIVERI | Matthieu Micolle | Sentech | SI 500D |
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| Interferometric profilometer ZYGO | Characterization | Franck CHOLLET | | ZYGO | Verifire GPI XP/D |
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| I-V & C-V Probe station | Characterization | Franck LARDET-VIEUDRIN | | CascadeMicrotech | EPS 150 Coax plus |
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| Laminoir | Lithography | Laurent ROBERT | Sylwester BARGIEL | Rohm and Haas | 350HR |
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| Laser CO2 - Coherent | Packaging | Sylwester BARGIEL | | Coherent | PL-C30 |
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| laser lithography system MLA150 high resolution | Lithography | Guillaume Jutzi | Laurent ROBERT | Heidelberg | MLA150 high resolution |
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| Laser Marking System | Lithography | Marina RASCHETTI | Laurent ROBERT | Traçamatrix | Traçamatrix |
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| MEB/SEM Apreo S | Characterization | Marina RASCHETTI | Roland SALUT | Thermofisher | Apreo S |
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View
| Megasonic cleaner CL200 | Packaging | Sylwester BARGIEL | | Suss Microtec | CL200 |
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| MEMS Analyser | Characterization | Franck LARDET-VIEUDRIN | | Polytec | MSA-500 |
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| MUEGGE Plasma O2 | Plasma etching | Laurent ROBERT | Samuel Queste | MUEGGE | MUEGGE R3T |
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| Nanoscribe | Lithography | Gwenn ULLIAC | | Nanoscribe | Photonic Professional GT |
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| Optical microscope Leica DM8000 | Characterization | Marina RASCHETTI | Roland SALUT | Leica | DM8000 |
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| Oven Litho 1 | Lithography | Laurent ROBERT | | Thermocenter | XXX |
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| Oven Litho 2 | Lithography | Laurent ROBERT | | Thermocenter | XXX |
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| Petite presse | Packaging | Sylwester BARGIEL | | Home made equipment | NC |
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| Pick and Place HB70 | Packaging | Sylwester BARGIEL | Franck LARDET-VIEUDRIN | TPT | HB-70 |
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| Polisseuse Logitech PM6 | Dicing - Polishing | Ludovic GAUTHIER-MANUEL | | Logitech | PM6 |
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| Pulvé DP650 | Deposition | Stefania OLIVERI | Matthieu Micolle | Alliance Concept | DP650 |
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| Pulvé MP450S | Deposition | Stefania OLIVERI | Matthieu Micolle | Plassys | MP450S |
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| Pulvé MP500 | Deposition | Stefania OLIVERI | Matthieu Micolle | Plassys | MP500 |
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| Pulvé MP700S | Deposition | Stefania OLIVERI | Matthieu Micolle | Plassys | MP700S |
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| QS WET 300 | Lithography | Guillaume Jutzi | Marion Vieira | Solarsemi (Microtest) | QSW300 SM |
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| RIE Corial | Plasma etching | Djaffar BELHARET | Samuel Queste | Corial | 200 R |
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| RIE-O2-Nanoplas | Plasma etching | Djaffar BELHARET | Samuel Queste | Nanoplas | DSB 6000 |
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| Scie DAD 321 | Dicing - Polishing | Ludovic GAUTHIER-MANUEL | | DISCO | DAD 321 |
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| Scie DAD 3350 | Dicing - Polishing | Ludovic GAUTHIER-MANUEL | | DISCO | DAD 3350 |
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| SEMI AUTOMATIC PROBER | Characterization | Valérie Soumann | Thomas BARON | MICROWORLD | Signatone & own software |
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| Sorbonne Acide | Chemistry | Marion Vieira | Laurent ROBERT | Minaservices | Wet Bench |
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| Sorbonne BHF | Chemistry | Marion Vieira | Laurent ROBERT | XXX | XXX |
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| Sorbonne HF | Chemistry | Marion Vieira | Laurent ROBERT | XXX | XXX |
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| Sorbonne KOH 1 ( Process standard) | Chemistry | Marion Vieira | Laurent ROBERT | XXX | XXX |
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| Sorbonne KOH 2 (Process FEMTOPRINT) | Chemistry | Sylwester BARGIEL | Marion Vieira | XXX | XXX |
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| Sorbonne Litho 1 | Chemistry | Marion Vieira | Laurent ROBERT | Minaservices | Sorbonne de chimie |
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| Sorbonne Solvant | Chemistry | Marion Vieira | Laurent ROBERT | Minaservices | Wet Bench |
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| Spin Coater OC22 | Lithography | Laurent ROBERT | | Solarsemi | OC ST22 |
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| Spin Coater RC-8 | Lithography | Laurent ROBERT | | Karl Suss | RC-8 |
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| Spray coating | Lithography | Laurent ROBERT | | SUSS Microtec | Alta Spray |
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View
| Station E-Beam | Nanotechnology | Roland SALUT | Marina RASCHETTI | Raith | Voyager |
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| STYLUS PROFILOMETER DEKTAK XT | Characterization | Marina RASCHETTI | Laurent ROBERT | Bruker | Dektak XT |
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| Surface activation NP12 | Packaging | Sylwester BARGIEL | | Suss Microtec | NP12 |
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| Surface treatment plasma Plasma-Cute | Other processes | Franck CHOLLET | | Femto-Science | Cute |
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| TEPLA Plasma O2 | Plasma etching | Djaffar BELHARET | Samuel Queste | TEPLA | PVA TEPLA GIGABatch360M |
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| Wafer Aligner-Bonder AML 6" | Packaging | Sylwester BARGIEL | | AML | AWB |
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| Wafer bonder AML402P | Packaging | Sylwester BARGIEL | | Applied Microengineering Ltd. | 402P |
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| Wafer bonder EVG501 | Packaging | Sylwester BARGIEL | | EVG | 501 |
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| Wafer surface measurement Vantage 2 | Characterization | Ludovic GAUTHIER-MANUEL | | Accelonix | Cybertechnologies Vantage 2 |
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| Vapor HF | Plasma etching | Samuel Queste | Djaffar BELHARET | SPTS | PrimaxxuEtch |
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| Wetbench for PDMS | Other processes | Franck CHOLLET | | NC | NC |
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| Wire Bonder TPT 16 | Packaging | Franck LARDET-VIEUDRIN | | TPT | HB-16 |