TECHNICAL SPECIFICATIONS

APPLICATIONS

System

Cassette to cassette with high throughput

fully automated

Adherence promotor treatment

Photoresist coating:

S1813: 1.25 µm

AZnLof: 1.3 µm

AZ 9260: 6.1 µm

SU_8  3050: 50 µm

Photoresist development

Substrate size

3” & 4” circular wafers

Resists

4 dispense lines + 1 syringe (thick resist)

Baking

4 hot plates (contact and proximity mode)

Developer

3 developer lines (TMAH, KOH & PGMEA)

Spray

Recipes

Library of recipes