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QS WET 300 (L16)
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Guillaume Jutzi
2nd Responsible:
Marion Vieira
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Description
Technical specifications :
Nozzle :
Piranha puddle and spray
Heated solvent DMSO (max 80°C)
High pressure deionised water (30 to 180 bars)
Megasonic deionised water
Alkaline puddle and spray
Nitrogene
Back side rince
Chuck by clamp :
Masks : 7”, 5” and 4 inches
Wafer : 6”, 4” and 3 inches
APPLICATIONS : Mask and wafer cleaner
Details
Tool name:
QS WET 300
Area/room:
SB1 - Lithographie 1 (Masqueur)
Category:
Lithography
Manufacturer:
Solarsemi (Microtest)
Model:
QSW300 SM
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