Picture of QS WET 300
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Guillaume Jutzi
2nd Responsible:
Marion Vieira
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Description

Technical specifications :

Nozzle :

  • Piranha puddle and spray
  • Heated solvent DMSO (max 80°C)
  • High pressure deionised water (30 to 180 bars)
  • Megasonic deionised water
  • Alkaline puddle and spray
  • Nitrogene
  • Back side rince

Chuck by clamp :

  • Masks : 7”, 5” and 4 inches
  • Wafer : 6”, 4” and 3 inches

APPLICATIONS : Mask and wafer cleaner

 

Details
Tool name:
QS WET 300
Area/room:
SB1 - Lithographie 1 (Masqueur)
Category:
Lithography
Manufacturer:
Solarsemi (Microtest)
Model:
QSW300 SM
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Tool Modes
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