Picture of Station E-Beam
Current status:
AVAILABLE
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  • Application Field

  • Electronic lithography

 

  • Technical Characteristics

  • Filament                                                                    Schottky TFE
  • Déplacement de la platine                                        100mm x 100mm x 30mm
  • Taille de spot                                                             <2nm @ 20keV
  • Plage de courant                                                       5pA – 20nA
  • Densité de courant                                                    > 7500 A/cm²
  • Stabilité du courant                                                  <0 .5%/h
  • Détecteurs                                                                 In Lens, Everhart Thornley
  • Largeur de ligne min                                                  20nm
  • Précision de raccord de champ                                 60nm (mean+3 sigma)
  • Précision d’ajustement niveau à niveau                   40nm (mean+3 sigma)
  • Format de fichiers                                                      GDSII
Tool name:
Station E-Beam
Area/room:
SB1 - Salle E-Beam
Category:
Nanotechnology
Manufacturer:
Raith
Model:
E_line
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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