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AVAILABLE
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TECHNICAL SPECIFICATIONS :  

CCP source: 600W

Clamping chuck: Mechanic

Gas : SF6, C2F6, O2, CHF3, Ar

Mask: PR, SiO2, Metallic masks are allowed

Quartz and graphite shuttles (compatible 75, 100, 150 mm wafers)

Liner SP20 for protection of reactor from non-volatile byproducts

WAFERS  : 4 inch, samples can be glued on 3’’ or 4” carrier wafer

End point detection : EPD Interferometry HORIBA Jobin-Yvon (wavelength 673,7 nm, spot size 20µm)

 

APPLICATIONS  :

Nano-metric & submicronic etching on variety of materials (dielectrics, SC, piezo-electric,…)

Tool name:
RIE Corial
Area/room:
SB2 - Gravure
Category:
Plasma etching
Manufacturer:
Corial
Model:
200 R
Max booking time, day:
8 hours
Max booking time, night:
0 hours
No. of future bookings:

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