Picture of Electroformage 1
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Marion Vieira
2nd Responsible:
Laurent ROBERT
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Description

Deposition bath avaliable :

-Acid Copper

-Bright Nickel

roughness : Ra= 2-5nm

stress : for a layer of 10µm on a Si wafer 500µm

  • 0.5 A/dm² : σ = -6 MPa
  • 1.5 A/dm² σ = -55Mpa

-Acid Gold

-Platinium

 

Details
Tool name:
Electroformage 1
Area/room:
SB2 - Chimie 2 (Electroformage)
Category:
Chemistry
Manufacturer:
XXX
Model:
XXX
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